Advances in resist materials and processing technology XXVII (22-24 February 2010, San Jose, California, United States)Allen, Robert D; Somervell, Mark Howell.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 2 vol, 2, isbn 978-0-8194-8053-8 0-8194-8053-3Conference Proceedings

Advances in resist materials and processing technology XXVIII (28 February-2 March 2011, San Jose, California, United States)Allen, Robert D; Somervell, Mark Howell.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 2 vol, 2, isbn 978-0-8194-8531-1Conference Proceedings

The Evolution of Patterning Process Models in Computational LithographySTURTEVANT, John L.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 763902.1-763902.13, 2Conference Paper

Materials Challenges for sub-20nm lithographyTHACKERAY, James W.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 797204.1-797204.16, 2Conference Paper

Development of hard mask resist materials in nanoimprint lithographyTAKEI, Satoshi; OGAWA, Tsuyoshi.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 79722C.1-79722C.8, 2Conference Paper

The Imaging Study of a Novel Photopolymer Used in I-line Negative-tone resistLIU LU; ZOU YINGQUAN.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 76391B.1-76391B.6, 2Conference Paper

In situ dissolution analysis of EUV resistsITANI, Toshiro; SANTILLAN, Julius Joseph.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 79720H.1-79720H.8, 2Conference Paper

Synthesis and Photo-initiated Polymerization of Silicon-Containing Hybrid MonomersFANG YUAN; ZOU YINGQUAN.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 79722B.1-79722B.7, 2Conference Paper

A study on post exposure delay of negative tone resist and its chemistryTOUKHY, Medhat; PAUNESCU, Margareta; CHUNWEI CHEN et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 79721L.1-79721.7, 2Conference Paper

E-beam Patterning and Stability Study of Sub-22 nm HSQ PillarsCHEN, Wei-Su; TSAI, Ming-Jinn.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 79722V.1-79722V.9, 2Conference Paper

Predicting resist sensitivity to chemical flare effects though use of exposure density gradient methodHYATT, Michael; DEVILLIERS, Anton; JAIN, Kaveri et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 79721M.1-79721L.5, 2Conference Paper

Process Optimization of High Aspect Ratio Sub-32 nm HSQ/AR3 Bi-layer Resist PillarCHEN, Wei-Su; TSAI, Ming-Jinn.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 79722P.1-79722P.11, 2Conference Paper

Regeneration of imprint molds using vacuum ultraviolet lightNAKAO, Masashi; YAMAGUCHI, Masanori; YABU, Shintaro et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 79722M.1-79722M.6, 2Conference Paper

Study on a few α-disulfone compounds as photoacid generatorsDONGFANG GUO; JUAN LIU; LIYUAN WANG et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 79722D.1-79722D.8, 2Conference Paper

Development of plant-based resist materials in electron beam lithographyTAKEI, Satoshi; OSHIMA, Akihiro; YANAMORI, Naomi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 797229.1-797229.6, 2Conference Paper

Physical Modeling of Developable BARC at KrFREILLY, Michael; BIAFORE, John; CAMERON, James F et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 79720Z.1-79720Z.10, 2Conference Paper

Defect performance of a 2X node resist with a revolutionary point-of-use filterBRAGGIN, J; RAMIREZ, R; WU, A et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 76391E.1-76391E.8, 2Conference Paper

Dynamics of Radical Cation of Poly(4-hydroxystyrene) Generated in Thin Film upon Exposure to Electron BeamNATSUDA, Kenichiro; KOZAWA, Takahiro; OKAMOTO, Kazumasa et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 76391K.1-76391K.9, 2Conference Paper

New self-assembly strategies for next generation lithographySCHWARTZ, Evan L; BOSWORTH, Joan K; PAIK, Marvin Y et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 76390G.1-76390G.11, 2Conference Paper

Study on approaches for improvement of EUV-resist sensitivityTARUTANI, Shinji; TSUBAKI, Hideaki; TAKAHASHI, Hidenori et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 763909.1-763909.8, 2Conference Paper

Analysis of Resist Patterns for Material and Process Design -Parameter Extraction from Dose-Pitch Matrices of Line Width and Edge Roughness and Cross-Sectional SEM ImagesKOZAWA, Takahiro; OIZUMI, Hiroaki; ITANI, Toshiro et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 79720U.1-79720U.7, 2Conference Paper

Development of molecular resists based on Phenyl[4]calixarene for EBLTAKASUKA, Masaaki; OKADA, Yu; HAYASHI, Hiromi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 797223.1-797223.8, 2Conference Paper

EUV Negative Resist Based on Thiol-Yne SystemSHIRAI, Masamitsu; MAKI, Koichi; OKAMURA, Haruyuki et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 79721E.1-79721E.8, 2Conference Paper

High-sensitivity EUV resists based on fluorinated polymersYAMASHITA, Tsuneo; MORITA, Masamichi; TANAKA, Yoshito et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 79721G.1-79721G.13, 2Conference Paper

Negative Tone Development: Gaining insight through physical simulationROBERTSON, Stewart A; REILLY, Michael; BIAFORE, John J et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 79720Y.1-79720Y.11, 2Conference Paper